Published June 20, 1997 | Version v1
Journal article

Development of glancing-incidence and glancing-take-off X-ray fluorescence apparatus for surface and thin-film analyses

  • 1. Tohoku Univ., Sendai (Japan). Inst. for Materials Research
  • 2. ULVAC-PHI Inc., Chigasaki (Japan)
  • 3. Rigaku Denki Corp., Osaka (Japan)

Description

We have studied X-ray fluorescence analysis under glancing incidence and glancing take-off conditions. Recently, we have developed a third apparatus for detecting glancing-incidence and take-off X-ray fluorescence, which makes it possible to measure the incident-angle dependence, the take-off-angle dependence. X-ray reflectivity, and X-ray diffraction. Primarily, we have measured the take-off angular dependence of X-ray fluorescence using this apparatus. Glancing take-off X-ray fluorescence has some advantages in comparison with glancing-incidence X-ray fluorescence. The surface density and the absolute angles were determined by analysing the take-off angle dependence of the fluorescent X-rays emitted from identical atoms with the aid of the reciprocity theorem. (Author)

Additional details

Publishing Information

Journal Title
Spectrochimica Acta. Part B, Atomic Spectroscopy
Journal Volume
52B
Journal Issue
7
Journal Page Range
p. 841-846.
ISSN
0584-8547
CODEN
SAASBH

Conference

Title
6. conference on total reflection X-ray fluorescence analysis and related methods.
Acronym
TXRF'96
Dates
Jun 1996.
Place
Eindhoven (Netherlands); Dortmund (Germany).

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
28060740
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
DENSITY; INCIDENCE ANGLE; PERFORMANCE; REFLECTIVITY; SURFACES; THIN FILMS; X-RAY DIFFRACTION; X-RAY FLUORESCENCE ANALYSIS
Descriptors DEC
CHEMICAL ANALYSIS; COHERENT SCATTERING; DIFFRACTION; FILMS; NONDESTRUCTIVE ANALYSIS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SCATTERING; SURFACE PROPERTIES; X-RAY EMISSION ANALYSIS