Development of glancing-incidence and glancing-take-off X-ray fluorescence apparatus for surface and thin-film analyses
Creators
- 1. Tohoku Univ., Sendai (Japan). Inst. for Materials Research
- 2. ULVAC-PHI Inc., Chigasaki (Japan)
- 3. Rigaku Denki Corp., Osaka (Japan)
Description
We have studied X-ray fluorescence analysis under glancing incidence and glancing take-off conditions. Recently, we have developed a third apparatus for detecting glancing-incidence and take-off X-ray fluorescence, which makes it possible to measure the incident-angle dependence, the take-off-angle dependence. X-ray reflectivity, and X-ray diffraction. Primarily, we have measured the take-off angular dependence of X-ray fluorescence using this apparatus. Glancing take-off X-ray fluorescence has some advantages in comparison with glancing-incidence X-ray fluorescence. The surface density and the absolute angles were determined by analysing the take-off angle dependence of the fluorescent X-rays emitted from identical atoms with the aid of the reciprocity theorem. (Author)
Additional details
Publishing Information
- Journal Title
- Spectrochimica Acta. Part B, Atomic Spectroscopy
- Journal Volume
- 52B
- Journal Issue
- 7
- Journal Page Range
- p. 841-846.
- ISSN
- 0584-8547
- CODEN
- SAASBH
Conference
- Title
- 6. conference on total reflection X-ray fluorescence analysis and related methods.
- Acronym
- TXRF'96
- Dates
- Jun 1996.
- Place
- Eindhoven (Netherlands); Dortmund (Germany).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 28060740
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DENSITY; INCIDENCE ANGLE; PERFORMANCE; REFLECTIVITY; SURFACES; THIN FILMS; X-RAY DIFFRACTION; X-RAY FLUORESCENCE ANALYSIS
- Descriptors DEC
- CHEMICAL ANALYSIS; COHERENT SCATTERING; DIFFRACTION; FILMS; NONDESTRUCTIVE ANALYSIS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SCATTERING; SURFACE PROPERTIES; X-RAY EMISSION ANALYSIS