Accelerated oxidation behavior of NbSi2 coating grown on Nb substrate at 600–900 °C
Creators
- 1. Materials Architecturing Research Center, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of)
- 2. Advanced Analysis Center, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130-650 (Korea, Republic of)
Description
Highlights: • Study of accelerated isothermal oxidation behavior of NbSi2 coating grown on Nb substrate in air at 600–900 °C. • Pesting-induced accelerated oxidation was due to the cracking and spalling of NbSi2 coating at 700 °C. • Oxide fracture-induced accelerated oxidation was due to the cracking of oxide scale at 750 °C. • Accelerated oxidation model of NbSi2 coating has been established. - Abstract: Isothermal oxidation of NbSi2 coating formed on Nb substrate was investigated in air at 600–900 °C, which exhibited the complex and accelerated kinetics at intermediate temperatures and failed due to either the cracking of the NbSi2 coating or the oxide layer formed. This complex oxidation behavior was governed by the balance between the stress generated by the forming of oxide phases and the subsequent stress relaxation processes. Pesting-induced accelerated oxidation at 700 °C was affected by extrinsic factors such as pre-existing defects in NbSi2 coating. Accelerated oxidation originated from the oxide layer cracking at 750 °C was intrinsic to NbSi2.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.corsci.2018.07.001Additional details
Identifiers
- DOI
- 10.1016/j.corsci.2018.07.001;
- PII
- S0010938X1630912X;
Publishing Information
- Journal Title
- Corrosion Science
- Journal Volume
- 141
- Journal Page Range
- p. 97-108
- ISSN
- 0010-938X
- CODEN
- CRRSAA
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 51002337
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRACKING; FRACTURES; KINETICS; LAYERS; NIOBIUM SILICATES; OXIDATION; SCANNING ELECTRON MICROSCOPY; STRESS RELAXATION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DIFFRACTION; ELECTRON MICROSCOPY; FAILURES; MICROSCOPY; NIOBIUM COMPOUNDS; OXYGEN COMPOUNDS; PYROLYSIS; REFRACTORY METAL COMPOUNDS; RELAXATION; SCATTERING; SILICATES; SILICON COMPOUNDS; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.