Published November 2010 | Version v1
Journal article

Dynamic phase separation as revealed by the strong resistance relaxation in epitaxially shear-strained La0.67Ca0.33MnO3/NdGaO3(0 0 1) thin-films

  • 1. Hefei National Laboratory for Physical Sciences at Microscale, University of Science and Technology of China, Hefei 230026 (China)
  • 2. Department of Applied Physics, Northwestern Polytechnical University, Xi'an, Shanxi 710072 (China)
  • 3. Key Laboratory of Materials Physics, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031 (China)

Description

Strong phase competitions between the ferromagnetic metal and the charge-ordered-insulator have been induced in a wide temperature range of 10-256 K for the shear-strained La0.67Ca0.33MnO3/NdGaO3(0 0 1) films. Based on various magnetotransport measurements, the mobility of phase boundaries was inferred to change dramatically with temperature. In the high temperature range where the phase boundaries are movable, strong relaxation in resistivity was observed, while at the frozen temperatures lower than 40 K it is weakened. The resistivities tend to relax in accordance with the phase transitions driven by the temperature or magnetic field in the phase separation (PS) background. Moreover, to our surprise, while the melting fields of the insulating phase varied with film thicknesses, for a given film however, they stay unchanged when started with different phase fractions produced by the field or thermal cycling. The results show a crucial role of the inherent strain state in determining PS and phase competitions in these epitaxial thin films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jmmm.2010.07.003

Additional details

Identifiers

DOI
10.1016/j.jmmm.2010.07.003;
PII
S0304-8853(10)00467-1;

Publishing Information

Journal Title
Journal of Magnetism and Magnetic Materials
Journal Volume
322
Journal Issue
21
Journal Page Range
p. 3544-3550
ISSN
0304-8853
CODEN
JMMMDC

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.