Extreme ultraviolet-induced photoionized plasmas

In this work photoionized plasmas were created by irradiation of He or Ne gases with a focused extreme ultraviolet (EUV) beam from one of two laser–plasma sources employing Nd:YAG laser systems. The first of them was a 10 Hz laser–plasma EUV source, based on a double-stream gas-puff target, irradiated with a 3 ns per 0.8 J laser pulse. EUV radiation in this case was focused using a gold-plated grazing incidence ellipsoidal collector. The second source was based on a 10 ns per 10 J per 10 Hz laser system. In this case EUV radiation was focused using a gold-plated grazing incidence multifoil collector. Gases were injected into the interaction region, perpendicularly to an optical axis of the irradiation system, using an auxiliary gas puff valve. Spectral measurements in the EUV range were performed. In all cases the most intense emission lines were assigned to singly charged ions. The other emission lines belong to atoms or doubly charged ions. (paper)