Compositional analysis of hafnium nitride thin films by backscattering spectrometry with a proton beam

We measured the energy spectrum of protons backscattered from hafnium nitride thin films by rf magnetron sputtering and evaluated the concentrations of the constituents in the film with an aid of numerical simulation. The spectrum generated by the simulation with such assumption that film consisted only of hafnium and nitrogen did not reproduce the measured spectrum well. It was suggested that the film contains of other light elements such as carbon and oxygen. (author)