Published February 2010 | Version v1
Journal article

Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

  • 1. Institut de Microtechnique, Ecole Polytechnique Federale de Lausanne, Station 17, CH-1015 Lausanne (Switzerland)
  • 2. Institut des Materiaux, Ecole Polytechnique Federale de Lausanne, Station 12, CH-1015 Lausanne (Switzerland)
  • 3. SAFC Hitech Limited, Power Road, Bromborough, Wirral, CH62 3QF (United Kingdom)
  • 4. ABCD Technology Sarl, C/O UNIFID Conseils, 67 rue du Rhone, 1207 Geneve (Switzerland)

Description

A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl-amino-ethoxide (Nb(OEt)4(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient capability. An efficient optimization of the deposition process was achieved and both mass-transport- and chemical-reaction-limited regimes were identified.

Availability note (English)

Available from http://dx.doi.org/10.1088/1757-899X/8/1/012026

Additional details

Identifiers

Publishing Information

Journal Title
IOP Conference Series. Materials Science and Engineering (Online)
Journal Volume
8
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1757-899X

Conference

Title
Symposium G - Fundamentals and technology of multifunctional oxide thin films
Acronym
E-MRS 2009 spring meeting
Dates
8-12 Jun 2009
Place
Strasbourg (France)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43019031
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; NIOBIUM; NIOBIUM OXIDES; OPTIMIZATION; PRECURSOR
Descriptors DEC
CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELEMENTS; METALS; NIOBIUM COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; REFRACTORY METALS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS