Published April 18, 2011 | Version v1
Journal article

Iron distribution in silicon after solar cell processing: Synchrotron analysis and predictive modeling

  • 1. Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)
  • 2. Instituto de Energia Solar, Universidad Politecnica de Madrid, 28040 Madrid (Spain)
  • 3. Laboratory and Service Center, Fraunhofer Institute for Solar Energy Systems (ISE), 45884 Gelsenkirchen (Germany)
  • 4. Centro de Tecnologia del Silicio Solar (CENTESIL), 28905 Getafe (Spain)
  • 5. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)

Description

The evolution during silicon solar cell processing of performance-limiting iron impurities is investigated with synchrotron-based x-ray fluorescence microscopy. We find that during industrial phosphorus diffusion, bulk precipitate dissolution is incomplete in wafers with high metal content, specifically ingot border material. Postdiffusion low-temperature annealing is not found to alter appreciably the size or spatial distribution of FeSi2 precipitates, although cell efficiency improves due to a decrease in iron interstitial concentration. Gettering simulations successfully model experiment results and suggest the efficacy of high- and low-temperature processing to reduce both precipitated and interstitial iron concentrations, respectively.

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
98
Journal Issue
16
Journal Page Range
p. 162103-162103.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2011 American Institute of Physics