Published November 1993
| Version v1
Journal article
Nuclear analytical techniques and applications to materials processing
Description
This paper will present the application of Rutherford backscattering spectrometry to thin film steochiometry determination and application to optimization of the film process elaboration in the case of dielectric films (Ge,Pb,O) and ionic conductors films (Na,Al,O). After we shall present the application of particles induced gamma emission (PIGE) for the characterization of ternary compounds (B,Si,C) used as coating to protect composites materials. The last part of this paper will describe the determination of oxygen in the bulk of fluoride glasses with charged particles activation analysis. (orig.)
Additional details
Publishing Information
- Journal Title
- Journal de Physique. 4
- Journal Volume
- 3
- Journal Issue
- 7,pt.3
- Journal Page Range
- p. 2159-2163.
- ISSN
- 1155-4339
- CODEN
- JPICEI
Conference
- Title
- 3. European conference on advanced materials and processes (EUROMAT-3).
- Original Conference Title
- 3. Conference Europeenne sur les Materiaux et les Procedes Avances
- Dates
- 08-10 Jun 1993.
- Place
- Paris (France).
INIS
- Country of Publication
- France
- Country of Input or Organization
- France
- INIS RN
- 25054190
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACTIVATION ENERGY; BACKSCATTERING; CHARGED PARTICLES; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; DIELECTRIC MATERIALS; FLUORIDES; GAMMA SPECTRA; IONIC CONDUCTIVITY; MATERIALS TESTING; MEASURING METHODS; MIXTURES; OXYGEN; PIXE ANALYSIS; RUTHERFORD SCATTERING; SILICON CARBIDES; THIN FILMS
- Descriptors DEC
- CARBIDES; CARBON COMPOUNDS; CHEMICAL ANALYSIS; CHEMICAL COATING; DEPOSITION; DISPERSIONS; ELASTIC SCATTERING; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTS; ENERGY; FILMS; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; MATERIALS; NONDESTRUCTIVE ANALYSIS; NONMETALS; PHYSICAL PROPERTIES; SCATTERING; SILICON COMPOUNDS; SPECTRA; SURFACE COATING; TESTING; X-RAY EMISSION ANALYSIS