Formation of the dendrite structure at ion beam synthesis in the external magnetic field

For the first time the dendrite structure on the surface of single-crystal silicon wafers implanted with Fe+ at high fluences in the applied magnetic field was revealed by atomic-force microscopy. The nucleation and growth of dendrites were simulated using the modified model of the diffusion limited aggregation at ion implantation. The magnetic dipole-dipole interaction between diffusing implanted atoms and forming ferromagnetic clusters was also considered. In the frame of this model the form of the dendrite structure is mainly determined by the effective magnetic moment and the diffusion coefficient.