Published October 2003
| Version v1
Journal article
Structural and Magnetic Properties Of Fe/Si Multilayer Grown By Helicon Plasma Sputtering
- 1. Center for Research and Development of Materials Science and Technology, National Atomic Energy Agency, Serpong (Indonesia)
Description
Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ∼ 2nm for Fe thickness fixed at 2nm in order to investigated the anti ferromagnetic coupling behaviour. Also we grown the MLs with varius Fe thickness around 2-5nm for Silicon spacer fixed at tsi =1nm and 1.5nm. Present study found that in case of Silicon spacer thickness tsi =1nm multilayer film exhibit anti ferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness tFe =3nm and Si thickness tsi =1nm
Additional details
Additional titles
- Original title (Indonesian)
- Sifat Struktur Dan Magnetik Multilapisan Fe/Si yang Ditumbuhkan Dengan Sputtering Plasma Helicon
Publishing Information
- Journal Title
- Indonesian Journal of Materials Science
- Journal Volume
- 5
- Journal Issue
- 1
- Journal Page Range
- p. 24-28
- ISSN
- 1411-1098
INIS
- Country of Publication
- Indonesia
- Country of Input or Organization
- Indonesia
- INIS RN
- 36044165
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANTIFERROMAGNETIC MATERIALS; IRON; MAGNETIC PROPERTIES; MAGNETORESISTANCE; PLASMA; SILICON; SPUTTERING; THICKNESS; X-RAY DIFFRACTION
- Descriptors DEC
- COHERENT SCATTERING; DIFFRACTION; DIMENSIONS; ELECTRIC CONDUCTIVITY; ELECTRICAL PROPERTIES; ELEMENTS; MAGNETIC MATERIALS; MATERIALS; METALS; PHYSICAL PROPERTIES; SCATTERING; SEMIMETALS; TRANSITION ELEMENTS
Optional Information
- Notes
- 10 refs.; tabs.; 7 figs.