Published April 1990 | Version v1
Journal article

Development of hydrogenated amorphous silicon sensors for high energy photon radiotherapy imaging

  • 1. Dept. of Radiation Oncology, Univ. of Michigan, MI (USA)
  • 2. Michigan Univ., Ann Arbor, MI (USA). Dept. of Physics
  • 3. Xerox Palo Alto Research Center, Palo Alto, CA (USA)

Description

Measurements with a high energy radiotherapy photon beam have been performed on photosensitive n-i-p diodes fabricated from hydrogenated amorphous silicon. Such photodiodes can be configured into large two-dimensional arrays of addressable sensors suitable for real-time imaging of megavoltage treatment beams, as well as other applications such as diagnostic x-ray imaging. Signal data for a number of different diode configuration in a 6 MV photon treatment beam are presented. These measurements are presented as early results of an on-going examination of the signal properties of a-Si:H photodiodes for medical imaging applications

Additional details

Publishing Information

Journal Title
IEEE Transactions on Nuclear Science
Journal Volume
37
Journal Issue
2
Series
IEEE Trans. Nucl. Sci.
Journal Page Range
165-170
ISSN
0018-9499
CODEN
IETNA

Conference

Title
Institute for Electronic and Electrical Engineers (IEEE) nuclear science symposium.
Dates
15-19 Jan 1990.
Place
San Francisco, CA (USA).

Optional Information

Secondary number(s)
CONF-900143--.