Published December 10, 2015 | Version v1
Journal article

A New Si/TiO2/Pt p-n Junction Semiconductor to Demonstrate Photoelectrochemical CO2 Conversion

  • 1. School of Engineering and Computing Sciences, Durham University, South Road, Durham, England DH1 3LE (United Kingdom)
  • 2. UNESP, Chemistry Institute of Araraquara, R. Francisco Degni 55, 14800-060 Araraquara, SP (Brazil)

Description

This work presents a new Si/TiO2/Pt p-n junction semiconductor prepared by sputtering, chemical vapor deposition (CVD), photolithography and lift-off techniques. XRD, EDS, FE-SEM, diffuse reflectance (DRS) and photocurrent vs potential curves had been used for semiconductor characterization. The material was designed for high porosity and uniformity of both TiO2 and Pt deposits; both TiO2 anatase phase formation and Pt presence were confirmed. This semiconductor has a characteristic of high light absorption in the ultraviolet and visible regions. A good photocurrent response for the cathodic region was obtained in a CO2 saturated solution (−1.0 mA under −0.8 V and UV–vis light), confirming electron-hole pair formation and CO2 electron scavenging. A small Si/TiO2/Pt electrode (1 × 1 cm) was employed in photoelectrocatalytic CO2 reduction, forming methanol (0.88 mmol L−1), ethanol (2.60 mmol L−1) and acetone (0.049 mmol L−1) as products reaching a Faradaic efficiency of 96.5%. These results had been obtained under the following optimal experimental conditions: 0.1 mol L−1 NaHCO3, pH 8 saturated with CO2, 125 W UV–vis irradiation (from 250 to 600 nm) and −0.8 V applied potential. Suitable charge transfer mechanisms in the electrode surface, and products formation after CO2 reduction, are proposed.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.electacta.2015.10.077

Additional details

Identifiers

DOI
10.1016/j.electacta.2015.10.077;
PII
S0013-4686(15)30658-7;

Publishing Information

Journal Title
Electrochimica Acta
Journal Volume
185
Journal Page Range
p. 117-124
ISSN
0013-4686
CODEN
ELCAAV

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.