Published March 28, 2012 | Version v1
Journal article

Measurement of OH radicals at state X 2Π in an atmospheric-pressure micro-flow dc plasma with liquid electrodes in He, Ar and N2 by means of laser-induced fluorescence spectroscopy

  • 1. Department of Applied Physics, Research Unit Plasma Technology, Ghent University, Jozef Plateaustraat 22, Ghent B-9000 (Belgium)
  • 2. College of Electrical and Electronic Engineering, HuaZhong University of Science and Technology, WuHan, Hubei 430074 (China)

Description

The density of OH radicals in ground state is measured by laser-induced fluorescence (LIF) spectroscopy in the core of a micro-flow discharge in He, Ar and N2 with a water electrode. The lines P2(6), P1(4) and P2(3) of the X 2Π(v″ = 0) to the A 2∑+ (v′ = 1) transition are used for OH radical excitation. The density of the main quencher of OH radical in the core of the discharge is estimated based on the time decay of the LIF signal. It is revealed that the plasma core consists of a high amount of 8-10% of water vapour. The calculation of the absolute density of OH radical is carried out based on the model of LIF excitation including vibrational and translation energy transfer, and the results in different gases are presented for the discharge. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/45/12/125201

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
45
Journal Issue
12
Journal Page Range
[10 p.]
ISSN
0022-3727
CODEN
JPAPBE