Published February 11, 2002 | Version v1
Journal article

Spatially resolved electron temperature measurements with a microfabricated retarding field analyzer

  • 1. Microelectronics Development Laboratory, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)

Description

Electron temperature (Te) is an important parameter to quantify in the high-density plasmas commonly used in semiconductor manufacturing. Te is characteristic of the electron energy distribution which determines the plasma density and distribution of neutral and ionic species. Through application of theoretical considerations for the presheath and sheath, Te can be estimated from the ion energy distribution to a floating substrate. Utilizing microfabricated retarding field analyzers (RFAs) to measure the local ion energy distribution to a floating surface, spatially resolved Te measurements in an inductively coupled argon plasma have been made. Quantitative agreement between the RFA and Langmuir probe Te measurements was observed and the RFA Te measurements display the expected power, pressure, and spatial dependencies

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
80
Journal Issue
6
Journal Page Range
p. 932-934
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35011220
Subject category
S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ARGON; ELECTRON TEMPERATURE; ION TEMPERATURE; LANGMUIR PROBE; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA SHEATH
Descriptors DEC
ELECTRIC PROBES; ELEMENTS; FLUIDS; GASES; NONMETALS; PROBES; RARE GASES

Optional Information

Contract/Grant/Project number
Contract DE-AC04-94AL85000
Notes
(c) 2002 American Institute of Physics.