Spatially resolved electron temperature measurements with a microfabricated retarding field analyzer
- 1. Microelectronics Development Laboratory, Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
Description
Electron temperature (Te) is an important parameter to quantify in the high-density plasmas commonly used in semiconductor manufacturing. Te is characteristic of the electron energy distribution which determines the plasma density and distribution of neutral and ionic species. Through application of theoretical considerations for the presheath and sheath, Te can be estimated from the ion energy distribution to a floating substrate. Utilizing microfabricated retarding field analyzers (RFAs) to measure the local ion energy distribution to a floating surface, spatially resolved Te measurements in an inductively coupled argon plasma have been made. Quantitative agreement between the RFA and Langmuir probe Te measurements was observed and the RFA Te measurements display the expected power, pressure, and spatial dependencies
Additional details
Identifiers
- DOI
- 10.1063/1.1448170;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 80
- Journal Issue
- 6
- Journal Page Range
- p. 932-934
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35011220
- Subject category
- S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ARGON; ELECTRON TEMPERATURE; ION TEMPERATURE; LANGMUIR PROBE; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA SHEATH
- Descriptors DEC
- ELECTRIC PROBES; ELEMENTS; FLUIDS; GASES; NONMETALS; PROBES; RARE GASES
Optional Information
- Contract/Grant/Project number
- Contract DE-AC04-94AL85000
- Notes
- (c) 2002 American Institute of Physics.