Amorphous Ni-P alloys prepared for ion implantation

Ion implantation of 40 keV, P+ ions into polycrystalline Ni foils has been used to produce amorphous Ni-P alloys. The foils were subsequently investigated by electron microscopy and electron diffraction. The diffraction measurements confirm the presence of an amorphous surface layer. The ion implanted alloy is compared to similar material produced by the more usual techniques of electrodeposition and vapour quenching. After annealing, the implanted layer recrystallizes into a dense, small grained structure. Equivalent results have been obtained using Co and Fe as target materials. The data suggest that ion implantation should contribute to an understanding of the production and stability of amorphous metals. (author)