Published January 1985 | Version v1
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Thermal annealing of vacancy and interstitial loops in ion irradiated copper

Description

X-ray diffuse scattering has been used to study the thermal annealing of vacancy and interstitial loops in Ni-ion irradiated copper. The diffuse scattering formalism is reviewed and diffuse scattering measurements are reported on liquid-He temperature Ni-ion irradiated copper after annealing to 40, 275, and 3000C. Size distributions are presented for vacancy and interstitial loops after each anneal and the thermal-induced changes are discussed in terms of loop dissolution and coalescence

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01 as DE86002272.

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Additional details

Publishing Information

Imprint Pagination
7 p.
Report number
CONF-841157--99

Conference

Title
Materials Research Society annual meeting.
Dates
26-29 Nov 1984.
Place
Boston, MA (USA).