Published January 1985
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Thermal annealing of vacancy and interstitial loops in ion irradiated copper
Description
X-ray diffuse scattering has been used to study the thermal annealing of vacancy and interstitial loops in Ni-ion irradiated copper. The diffuse scattering formalism is reviewed and diffuse scattering measurements are reported on liquid-He temperature Ni-ion irradiated copper after annealing to 40, 275, and 3000C. Size distributions are presented for vacancy and interstitial loops after each anneal and the thermal-induced changes are discussed in terms of loop dissolution and coalescence
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01 as DE86002272.Files
17031403.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 7 p.
- Report number
- CONF-841157--99
Conference
- Title
- Materials Research Society annual meeting.
- Dates
- 26-29 Nov 1984.
- Place
- Boston, MA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 17031403
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ANNEALING; COPPER; INTERSTITIALS; MEV RANGE 10-100; NICKEL IONS; PHYSICAL RADIATION EFFECTS; SCATTERING; ULTRALOW TEMPERATURE; VACANCIES; X RADIATION
- Descriptors DEC
- ATOMIC IONS; CHARGED PARTICLES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELECTROMAGNETIC RADIATION; ELEMENTS; ENERGY RANGE; HEAT TREATMENTS; IONIZING RADIATIONS; IONS; METALS; MEV RANGE; POINT DEFECTS; RADIATION EFFECTS; RADIATIONS; TRANSITION ELEMENTS