Effect of a pulse magnetic field on a high pressure plasma

An r.f.. induction plasma torch is a convenient source for the production of high temperature, and steady dense plasma to study the ionic processes in the plasma. The temperature of the torch, supplied with organ, remains around 10,000 K for a wide range of gas flow rates and r.f. power, though the size of the plasma varies with gas flow rate and r.f. power. The application of a pulse magnetic field, however, has been shown to increase the plasma temperature by several thousand K. The application of the pulsed field has been found to produce oscillation on the surface of the plasma. Because of the increased temperature and conductivity the skin depth of the pulse applied field is found less than 1.4 cm, which is the radius of the plasma. (author)