Published September 1991 | Version v1
Journal article

Effect of low energy ions on Al/GaAs interface

  • 1. Moskovskij Inst. Ehlektronnoj Tekhniki, Moscow (Russian Federation)

Description

The effect of ion-beam treatment in 50-200 eV ion energy range on the characteristics of the contact with the Schottky barrier Al/GaAs is investigated. It is shown that the utilization of optimal energy range of 50-95 eV allows to improve the characteristics of the contact through reduction of radiation disturbances resulting in the formation of n+-contact disturbed layer. The application of efficient pulse photon annealing and combined process of contact establishment enhance this effect

Additional details

Additional titles

Subtitle (English)
1. Electric performances of contacts with Schottky barrier
Original title (Russian)
Влияние воздействия ионов пониженных энергий на границу раздела Ал/GaAs
Original subtitle (Russian)
1. Ehlektricheskie kharakteristiki kontakta s bar'erom Shottki.

Publishing Information

Journal Title
Mikroehlektronika
Journal Volume
20
Journal Issue
5
Journal Page Range
p. 475-480.
ISSN
0544-1269
CODEN
MKETA9