UV Direct Laser Interference Patterning of polyurethane substrates as tool for tuning its surface wettability

Highlights: • First reported experiments on Direct Laser Interference Patterning of polyurethane. • First reported sub-micrometer structures (feature size ∼250 nm) fabricated in polyurethane materials using laser processing technologies. • Anisotropic wetting behavior of structured surfaces and possibility to tune the contact angle as function of surface structure parameters. - Abstract: Direct Laser Interference Patterning (DLIP) is a versatile tool for the fabrication of micro and sub-micropatterns on different materials. In this work, DLIP was used to produce periodic surface structures on polyurethane (PU) substrates with spatial periods ranging from 0.5 to 5.0 μm. The influence of the laser energy density on the quality and topographical characteristics of the produced micropatterns was investigated. To characterize the surface topography of the produced structures, Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM) and Confocal Microscopy (CFM) were utilized. It was found that high quality and defect free periodic line-like patterns with spatial periods down to 500 nm could be fabricated, with structure depths between 0.88 up to 1.25 μm for spatial periods larger than 2.0 μm and up to 270 nm for spatial periods between 500 nm and 1.0 μm. Measurements of the contact angle of water on the treated surface allowed to identify an anisotropic wetting behavior depending mainly on the spatial period and filling factor of the structured surfaces.