Published October 23, 1984
| Version v1
Patent
Capacitatively coupled plasma device
Creators
Description
A capacitatively coupled plasma device has a plasma tube, an electrode positioned near the tube and means to supply a high voltage, high frequency potential such as a radio frequency to the tube to energize a flow of argon or like gas to form a plasma. A sample of material is excited by the plasma energy to emit characteristic radiation for analysis by suitable means such as spectrometric analysis or for other use and application
Availability note (English)
U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.Additional details
Publishing Information
- Imprint Pagination
- v p.
- IPC:
- Int. Cl. H01J 7/24; H05B 31/26.
- IPC
- Int. Cl. H01J 7/24; H05B 31/26.
- Patent number
- US patent document 4,479,075/A/
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 16062391
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- ACTIVATION ENERGY; ARGON; ELECTRIC POTENTIAL; ELECTRODES; FREQUENCY DEPENDENCE; IONIZATION; PLASMA; PLASMA JETS; PLASMA PRODUCTION; RF SYSTEMS; SPECTROSCOPY
- Descriptors DEC
- ELEMENTS; ENERGY; NONMETALS; RARE GASES
Optional Information
- Notes
- PAT-APPL-327031.