Published April 2005 | Version v1
Journal article

Effect of N+ ion implantation on corrosion resistance of zicaloy-4

  • 1. Tsinghua Univ., Beijing (China). Dept. of Engineering Physics
  • 2. Tsinghua Univ., Beijing (China). Dept. of Materials Science and Engineering

Description

In order to investigate effect of ion implantation on corrosion resistance of zircaloy-4, N+ ions from an accelerator at doses ranging from 4 x 1014 to 1 x 1016 cm-2 were employed. Effect of N+ ion implantation on passive current density was studied by electrodynamic polarization measurements in a 0.5 mol/L H2SO4 solution at room temperature, and Transmission Electron Microscopy (TEM) was used to examine the change of microstructures in the implantated surface. The potentiodynamic tests showed that with the increase of implanted dose, surface passive current density decreased remarkably. The enhancement of corrosion resistance can be attributed to the amorphous phase formation in the implanted surface. (authors)

Additional details

Publishing Information

Journal Title
Nuclear Techniques
Journal Volume
28
Journal Issue
4
Journal Page Range
p. 289-291
ISSN
0253-3219

Optional Information

Notes
3 figs., 9 refs.