Published January 2021 | Version v1
Journal article

Robust in-plane polarization switching in epitaxial BiFeO3 films

  • 1. Science and Technology on Electronic Test and Measurement Laboratory, North University of China, Taiyuan, 030051 (China)
  • 2. Department of Mechanical Engineering, National University of Singapore, , 117576 (Singapore)
  • 3. School of Physical Science and Technology, ShanghaiTech University, Shanghai, 201210 (China)

Description

Highlights:• Epitaxial BiFeO3 (BFO) thin films were prepared by Pulsed-Leaser Deposition (PLD) technology.• The abundant domain dynamic were investigated by scanning probe microscopy (SPM) and piezoresponse force microscopy (PFM).• Interesting domain dynamics with good retention and repeatability are observed under the external electric fields. -- Abstract: The enrichment domain state and its stability consist an imperative part regarding to the high density non-volatile ferroelectric random access memory (FRAM) devices. In this work, epitaxial BiFeO3 (BFO) thin films were prepared by pulsed-leaser deposition (PLD) technology, and the morphology, local polarization state and piezoelectric response were characterized by scanning probe microscopy (SPM) and piezoresponse force microscopy (PFM). The robust in-plane domain dynamic process is observed under the external electric fields. Furthermore, good retention and repeatability are observed especially under high temperature. The new-developed domain patterns are nearly stable, which is quite different from the existed research. The formation of these domains is probably induced by the combination of built-in electric fields and distribution of tip fields, both of which affect the polarization dynamic process. All the obtained results pave a great way for application corresponding to the FRAM devices especially under high temperature circumstance.

Additional details

Identifiers

DOI
10.1016/j.jallcom.2020.156988;
PII
S0925838820333521;

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
852
Journal Page Range
vp.
ISSN
0925-8388
CODEN
JALCEU

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Copyright
Copyright (c) 2020 Elsevier B.V. All rights reserved.