Force sensor fabrication by AgNWs film using 532 nm pulses laser
Creators
- 1. Taiwan Instrument Research Institute, National Applied Research Laboratories, Hsinchu, 30076 (China)
Description
This current study investigated the effects of laser direct writing (LDW) on the capacitance force sensor of a poly(3,4-ethylenedioxythiophene):poly(styrene sulfonic acid) film mixer with silver nanowire thin films by using a 532-nm laser system. The technique was combined with various scanning speeds (i.e., 800, 1000, and 1200 mm s−1) to investigate the effectiveness of the force sensor. During interdigitated electrode fabrication, the laser fluence and laser pulse repetition frequency were fixed at 5.42 J/cm2 and 40 kHz, respectively. Nonloading force and various loading force states were used to test the function of the electrode under different LDW conditions. A best correlation coefficient of approximately 0.88 confirmed a linear functional dependence between the square of the pattern width and capacitance under the micromachining speed of 1000 mm s−1. Moreover, in the nonloading force state, the capacitance value increased with the increase in the electrode pattern width under a micromachining speed of 800 mm s−1. Regarding the loading force status, the capacitance increased when the loading force increased from 18 to 90 g. When the interdigitated pattern line width was 500 μm and electrode micromachining speed was 800 mm s−1, the maximum capacitance value was 71.5 pF under a loading force of 90 g.
Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2019.04.171;
- PII
- S0169433219311730;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 484
- Journal Page Range
- p. 1019-1026
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 55046227
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CAPACITANCE; ELECTRODES; KHZ RANGE; LASERS; LINE WIDTHS; MACHINING; PULSES; SENSORS; SULFONIC ACIDS; THIN FILMS
- Descriptors DEC
- ELECTRICAL PROPERTIES; FILMS; FREQUENCY RANGE; ORGANIC ACIDS; ORGANIC COMPOUNDS; ORGANIC SULFUR COMPOUNDS; PHYSICAL PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2019 Elsevier B.V. All rights reserved.