WC/C:H films synthesized by an hybrid reactive magnetron sputtering/Plasma Enhanced Chemical Vapor Deposition process: An alternative to Cr (VI) based hard chromium plating
Creators
- 1. Materia Nova Research Center, Avenue Copernic 1, 7000 Mons (Belgium)
- 2. CRM group, allée de l'Innovation 1, B57, B-4000 Liège (Belgium)
- 3. Laboratory for Chemistry of Novel Materials, (CMN), CIRMAP, Université de Mons, 23 Place du Parc, 7000 Mons (Belgium)
- 4. Chimie des Interactions Plasma-Surface (ChIPS), CIRMAP, Université de Mons, 23 Place du Parc, 7000 Mons (Belgium)
Description
WC/C:H thin films have been synthesized by a hybrid Plasma Enhanced Chemical Vapor Deposition/Physical Vapor Deposition method consisting in the reactive sputtering of a tungsten target in Ar-C2H2 atmospheres. The influence of the gas mixture on the physico-chemical properties of WC/C:H layers including their chemical composition, morphology, tribological and mechanical features has been studied. X-ray photoelectron spectroscopy measurements reveal an increase in the carbon content and a higher aliphatic bonds density in detriment to the carbide ones as a function of the acetylene flow. These results, in combination with Raman spectroscopy, X-ray diffraction, transmission electron microscopy and atomic force microscopy data, allow to depict the material as crystallized WxC1 −y nano-spheres (corresponding to aggregate of smaller nanograins of W2C and WC1−x) diluted in a hydrogenated carbon matrix; the ratio between the hard crystallized WC phase and the softer hydrogenated carbon matrix being reduced when increasing the acetylene flow. The film nanohardness and tribological properties (i.e. friction coefficient and wear rate) are directly connected to the film chemical composition and structure. High nanohardness (~ 20 GPa), friction coefficient of μ = 0.5 and high wear rate (5.4 · 10−13 m2/N) are obtained for the lowest carbon content of 37 at.%. When increasing the carbon content in the film (77 at.%), the hardness strongly decreases to ~ 10 GPa and a lower friction coefficient (μ = 0.2) and wear rate (4.7 · 10−15 m2/N) are obtained. These properties are similar and even better than the ones of Cr(VI) based electroplating coatings, demonstrating the attractiveness of our WC/C:H films as a potential alternative to these coatings. - Highlights: • WC/C:H thin films are synthesized by an hybrid process. • WC/C:H thin film structure depends on argon/acetylene ratio. • Mechanical and tribological properties can be tailored. • Mechanical and tribological properties better than hard chromium are obtained.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2016.09.002Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2016.09.002;
- PII
- S0040-6090(16)30510-7;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 630
- Journal Page Range
- p. 79-85
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Symposium EE on Carbon-, Nitrogen-Containing Nanostructured Thin Films
- Acronym
- E-MRS spring meeting 2016
- Dates
- 2-6 May 2016
- Place
- Lille (France)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50023921
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ACETYLENE; ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; CHROMIUM; DENSITY; ELECTROPLATING; HARDNESS; MAGNETRONS; MIXTURES; PHYSICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN CARBIDES; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- ALKYNES; CARBIDES; CARBON COMPOUNDS; CHEMICAL COATING; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; DISPERSIONS; ELECTRODEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; FILMS; HYDROCARBONS; LASER SPECTROSCOPY; LYSIS; MECHANICAL PROPERTIES; METALS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; NONMETALS; ORGANIC COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; PLATING; REFRACTORY METAL COMPOUNDS; SCATTERING; SPECTROSCOPY; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; TUNGSTEN COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.