Published March 2021 | Version v1
Journal article

On the surface chemistry and the reuse of sulfur-doped TiO2 films as photocatalysts

  • 1. Universidade São Judas Tadeu, Taquari Street, 546, São Paulo (Brazil)
  • 2. Nuclear and Energy Research Institute, IPEN–CNEN/SP, University of São Paulo, Prof. Lineu Prestes Avenue, 2242 (Brazil)

Description

Highlights: • S–TiO2 catalysts obtained under H2S atmosphere at low temperature are highly efficient. • SO42− was formed on the films surface, indicating the substitution of Ti4+ by S6+. • XPS depth profile revealed the cationic diffusion of sulfur by the alternative S-doped method. • S-doped TiO2 film presented 72.1% of dye degradation under visible light. • S–TiO2 films exhibit high stability and efficiency around 70% in the first 3 cycles. The surface chemistry and recyclability of sulfur-doped titanium dioxide (TiO2) films was evaluated. The photocatalysts were grown by metalorganic chemical vapor deposition (MOCVD) at 400 °C. The films were sulfur-doped at 50 °C by using hydrogen sulfide (H2S) as sulfur source. The photocatalytic behavior of the films was measure by monitoring the methyl orange dye decolorization under visible light for several cycles. The films are formed only for the anatase crystalline phase. The results demonstrated that no structural modifications or significant differences in the morphology of the films occurred after their use. The sulfur-doped TiO2 films presented good photocatalytic activity, with an efficiency of 72.1% under visible light in its first use. The durability experiments suggest that even with the dye impregnation on the catalyst surface, the photocatalytic activity of the S-doped TiO2 films remained around 70% in the first 3 cycles, which allows their practical application for water treatment and purification under sunlight.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchemphys.2021.124231

Additional details

Identifiers

DOI
10.1016/j.matchemphys.2021.124231;
PII
S0254058421000146;

Publishing Information

Journal Title
Materials Chemistry and Physics (Print)
Journal Volume
261
Journal Page Range
vp.
ISSN
0254-0584
CODEN
MCHPDR

Optional Information

Copyright
Copyright (c) 2021 Elsevier B.V. All rights reserved.