Tribological and cutting behavior of silicon nitride tools coated with monolayer- and multilayer-microcrystalline HFCVD diamond films
Creators
- 1. School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China)
Description
Highlights: ► Multilayer-MCD film shows lower friction coefficient compared monolayer-MCD film. ► Multilayer-MCD film is similar in friction coefficient to monolayer-SMCD film. ► Multilayer-MCD film presents the higher wear resistance than monolayer-SMCD film. ► Multilayer-MCD diamond insert presents the perfect behavior regarding tool wear. - Abstract: Monolayer-micrometric (MN-MCD), monolayer-submicrometric (MN-SMCD) and multilayer-micrometric (MT-MCD) diamond films are grown on silicon nitride substrates by hot filament chemical vapor deposition (HFCVD) technique. The as-deposited diamond films are characterized with scanning electron microscope (SEM), X-ray diffraction (XRD), energy-dispersive X-ray spectrometer (EDS), Raman spectrum and 3D surface topography. Tribological properties are assessed by the sliding tests using a reciprocal motion ball-on-flat (BOF) configuration. The friction coefficients are measured as 0.126 for the MN-MCD films, 0.076 for the MN-SMCD films and 0.071 for the MT-MCD films during dry sliding against silicon nitride counterface. The different carbon content of the films may result in the visible diminution of friction coefficient for the MT-MCD films relative to the MN-MCD films. The results show that the MN-MCD and MT-MCD films present the much higher wear resistance than the MN-SMCD films. Meanwhile, the cutting performances of as-deposited diamond films are evaluated by machining aluminum–silicon alloy material. The experimental results show that the MT-MCD insert presents the best behavior regarding the tool wear.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2012.11.133Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2012.11.133;
- PII
- S0169-4332(12)02108-3;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 265
- Journal Page Range
- p. 850-859
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44103163
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CUTTING; DIAMONDS; FILMS; FRICTION; FRICTION FACTOR; LAYERS; PERFORMANCE; RAMAN SPECTRA; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDES; SURFACES; TOPOGRAPHY; WEAR; WEAR RESISTANCE; X-RAY DIFFRACTION; X-RAY SPECTROMETERS
- Descriptors DEC
- CARBON; CHEMICAL COATING; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; DIMENSIONLESS NUMBERS; ELECTRON MICROSCOPY; ELEMENTS; MACHINING; MEASURING INSTRUMENTS; MECHANICAL PROPERTIES; MICROSCOPY; MINERALS; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; PNICTIDES; SCATTERING; SILICON COMPOUNDS; SPECTRA; SPECTROMETERS; SURFACE COATING
Optional Information
- Copyright
- Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.