Published January 15, 2013 | Version v1
Journal article

Tribological and cutting behavior of silicon nitride tools coated with monolayer- and multilayer-microcrystalline HFCVD diamond films

  • 1. School of Mechanical Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China)

Description

Highlights: ► Multilayer-MCD film shows lower friction coefficient compared monolayer-MCD film. ► Multilayer-MCD film is similar in friction coefficient to monolayer-SMCD film. ► Multilayer-MCD film presents the higher wear resistance than monolayer-SMCD film. ► Multilayer-MCD diamond insert presents the perfect behavior regarding tool wear. - Abstract: Monolayer-micrometric (MN-MCD), monolayer-submicrometric (MN-SMCD) and multilayer-micrometric (MT-MCD) diamond films are grown on silicon nitride substrates by hot filament chemical vapor deposition (HFCVD) technique. The as-deposited diamond films are characterized with scanning electron microscope (SEM), X-ray diffraction (XRD), energy-dispersive X-ray spectrometer (EDS), Raman spectrum and 3D surface topography. Tribological properties are assessed by the sliding tests using a reciprocal motion ball-on-flat (BOF) configuration. The friction coefficients are measured as 0.126 for the MN-MCD films, 0.076 for the MN-SMCD films and 0.071 for the MT-MCD films during dry sliding against silicon nitride counterface. The different carbon content of the films may result in the visible diminution of friction coefficient for the MT-MCD films relative to the MN-MCD films. The results show that the MN-MCD and MT-MCD films present the much higher wear resistance than the MN-SMCD films. Meanwhile, the cutting performances of as-deposited diamond films are evaluated by machining aluminum–silicon alloy material. The experimental results show that the MT-MCD insert presents the best behavior regarding the tool wear.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2012.11.133

Additional details

Identifiers

DOI
10.1016/j.apsusc.2012.11.133;
PII
S0169-4332(12)02108-3;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
265
Journal Page Range
p. 850-859
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.