Published October 2016
| Version v1
Journal article
Interface controlled microstructure evolution in nanolayered thin films
- 1. Institute of Materials Science and Technology, TU Wien (Austria)
- 2. Department of Materials Physics, Montanuniversität Leoben (Austria)
- 3. Department of Physics Chemistry and Biology, Linköpings Universitet (Sweden)
Description
X-ray nano-diffraction and transmission electron microscopy were conducted along the thickness of a ~ 4 μm thick CrN/AlN multilayer with continuously increasing AlN layer thicknesses from ~ 1 to 15 nm on ~ 7 nm thick CrN template layers. The experiments reveal coherent growth, large columnar grains extending over several (bi-)layers for thin AlN layer thicknesses below ~ 4 nm. Above ~ 4 nm, the nucleation of the thermodynamically stable wurtzite structured AlN is favored, leading to coherency breakdown and reduction of the overall strains, disrupting the columnar microstructure and limiting the maximum grain size in film growth direction to the layer thickness.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.scriptamat.2016.05.031Additional details
Identifiers
- DOI
- 10.1016/j.scriptamat.2016.05.031;
- PII
- S1359-6462(16)30210-X;
Publishing Information
- Journal Title
- Scripta Materialia
- Journal Volume
- 123
- Journal Page Range
- p. 13-16
- ISSN
- 1359-6462
- CODEN
- SCMAF7
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 48012819
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; BREAKDOWN; CHROMIUM NITRIDES; GRAIN SIZE; INTERFACES; LAYERS; NUCLEATION; STRAINS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHROMIUM COMPOUNDS; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; MICROSTRUCTURE; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SCATTERING; SIZE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2016 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.