Published May 10, 2004 | Version v1
Journal article

Heteroepitaxial growth of wurtzite InN films on Si(111) exhibiting strong near-infrared photoluminescence at room temperature

  • 1. Nanophotonics Center/OES, Industrial Technology Research Institute, Hsinchu 310, Taiwan (China)
  • 2. Department of Physics, National Central University, Chung-Li 32054, Taiwan (China)
  • 3. Department of Physics, National Tsing-Hua University, Hsinchu 300, Taiwan (China)

Description

High-quality InN epitaxial films have been grown by nitrogen-plasma-assisted molecular-beam epitaxy on Si(111) substrates using a double-buffer technique. Growth of a (0001)-oriented single crystalline wurtzite-InN layer was confirmed by reflection high-energy electron diffraction, x-ray diffraction, and Raman scattering. At room temperature, these films exhibited strong near-infrared (0.6-0.9 eV) photoluminescence (PL). In addition to the optical absorption measurement of absorption edge and direct band nature, the PL signal was found to depend linearly on the excitation laser intensity over a wide intensity range. These results indicate that the observed PL is due to the emission of direct band-to-band recombination rather than the band-to-defect (or impurity) deep emission

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
84
Journal Issue
19
Journal Page Range
p. 3765-3767
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2004 American Institute of Physics.