Diffraction-aided laser-induced microstructuring of thin TiO2 films on glass

Thin films of TiO2 are deposited by magnetron sputtering on glass substrate and are irradiated by ultraviolet radiation using a KrF excimer laser. These thin films are patterned with a razor blade placed in the way of the radiation. When the fluence is in the 1250-1550 mJ/cm2 range, a regular structure appears, with controlled ablation of the films. It is shown that above a critical local fluence, the ablated depth varies linearly with the local fluence. The proportionality factor is shown to be equal to two photons per evaporated molecule