Published September 15, 2011 | Version v1
Journal article

Shear banding deformation in Cu/Ta nano-multilayers

  • 1. MOE Key Laboratory for Strength and Vibration, School of Aerospace, Xi'an Jiaotong University, Xi'an, 710049 (China)
  • 2. State Key Laboratory for Mechanical Behavior of Material, Xi'an Jiaotong University, Xi'an, 710049 (China)

Description

Highlights: → Formation of shear bands in Cu/Ta multilayers is layer thickness dependent. → Unique layer-morphology with prevalent mismatched laminate structure was observed. → A new physical mechanism that dominates shear band formation is suggested. - Abstract: Nanoscale Cu/Ta multilayers with individual layer thickness ranging from 3 to 70 nm were deformed under nanoindentation at room temperature. Shear bands can be observed only when individual layer thickness is reduced to 9 nm or below, indicating formation of shear bands in the Cu/Ta multilayers is layer thickness dependent. By observing the cross sectional transmission electron microscope images of the indentation fabricated through focused ion beam technique, shear banding deformation causing a unique layer-morphology with prevalent mismatched laminate structure has been reported for the first time. By capturing and analyzing a series of typical indentation-induced deformed microstructures, a new physical mechanism of shear banding behavior in metallic nano-multilayers is suggested.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.msea.2011.06.019

Additional details

Identifiers

DOI
10.1016/j.msea.2011.06.019;
PII
S0921-5093(11)00671-X;

Publishing Information

Journal Title
Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing
Journal Volume
528
Journal Issue
24
Journal Page Range
p. 7290-7294
ISSN
0921-5093
CODEN
MSAPE3

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44010650
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
COPPER; DEFORMATION; GRAIN BOUNDARIES; IMAGES; ION BEAMS; LAYERS; MORPHOLOGY; NANOSTRUCTURES; SHEAR; TANTALUM; TEMPERATURE RANGE 0273-0400 K; THICKNESS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
BEAMS; DIMENSIONS; ELECTRON MICROSCOPY; ELEMENTS; METALS; MICROSCOPY; MICROSTRUCTURE; REFRACTORY METALS; TEMPERATURE RANGE; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2011 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.