Published March 2021 | Version v1
Journal article

Influence of threading dislocation on on-resistance and breakdown phenomena of vertical GaN p-n junction diodes

  • 1. Hosei University, Koganei, Tokyo (Japan)
  • 2. SCIOCS Co., Ltd., Hitachi, Ibaraki (Japan)

Description

The correlation between current-voltage (I-V) characteristics and threading dislocations was evaluated using p-n junction diodes on high-quality GaN substrate with average threading dislocation density (TDD) ≦ 4 x 105 cm-2 by newly developed maskless 3D (M-3D) method. In forward I-V characteristics, it was found that the on-resistance (Ron) increases as the number of dislocations in the diode increases. This result indicates that reducing the number of dislocations is effective in improving the forward I-V characteristics. On the other hand, in reverse I-V characteristics, it was found that there was no clear correlation between the breakdown voltage (VB) and the number of dislocations. Also, the p-n diode's destruction point and the dislocation position did not match in almost all of the measured p-n diodes. These results suggest that the dislocation affects very little on VB and the p-n diode destruction. (author)

Additional details

Publishing Information

Journal Title
Report of Research Center of Ion Beam Technology, Hosei University. Supplement
Journal Issue
no.39
Series
雑誌名:法政大学イオンビーム工学研究所報告.別冊
Journal Page Range
p. 29-38
ISSN
0914-2908

Optional Information

Notes
60 refs., 9 figs.