Published 1980 | Version v1
Book

Effects of primary beam incidence in microanalysis

Creators

  • 1. Faculte des Sciences et Techniques, B.P.W. SFAX - TUNISIE

Description

It has been shown that in electron probe microanalysis the massic concentration of the emitter element in the pattern and in the reference are approximately equal to the ratio of the corresponding intensity X generated by the target. The author has attempted to calculate the intensity X emitted by an element in a very weak concentration in the target and to obtain the conditions for optimizing this intensity. The fluorescence correction is assumed to be insignificant. A formula is obtained which correlates the measured intensities at the microprobe to the true concentration of the diluted element. (Auth.)

Additional details

Publishing Information

Publisher
Seventh European Congress on Electron Microscopy Foundation.
Imprint Place
Leiden (Netherlands)
ISBN
90-9000148-4
Imprint Title
Analysis
Imprint Pagination
292 p.
Journal Page Range
p. 148-149.

Conference

Title
7. European congress on electron microscopy.
Dates
24 - 29 Aug 1980.
Place
The Hague (Netherlands).

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
14745205
Subject category
S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACCURACY; BEAM OPTICS; CORRECTIONS; ELECTRON BEAMS; ELECTRON MICROPROBE ANALYSIS; OPTIMIZATION; QUANTITATIVE CHEMICAL ANALYSIS; QUANTITY RATIO
Descriptors DEC
BEAMS; CHEMICAL ANALYSIS; LEPTON BEAMS; NONDESTRUCTIVE ANALYSIS; PARTICLE BEAMS

Optional Information

Notes
Imprint:Distributed by North-Holland, Amsterdam, Netherlands.