Published March 2002 | Version v1
Journal article

Influence of Ta+N ion implantation with elevated temperature on the property of hard metal

  • 1. Southwestern Inst. of Physics, Chengdu (China)
  • 2. Chengdu Univ. of Technology, Chengdu (China)

Description

Hard metal has been implanted with nitrogen plus tantalum dual ions at temperature of 100 degree C and 400 degree C with a dose of 8 x 1017 ions·cm-2. Microhardness measurements were performed to evaluate the surface property improvements. Auger electron spectroscopy is used to determine the nitrogen and tantalum concentration depth profiles. The thickness of implanted layers increased by about an order of magnitude when the temperature was elevated from 100 degree C to 400 degree C. Higher surface hardness is obtained in the higher temperature implantation, an improvement of 200% for the 400 degree C implantation. Scanning electron microscopy image shows distinct microstructure changes, and X-ray diffraction (XRD) showed the presence of nitrides of tantalum, tungsten in the implanted surface

Additional details

Publishing Information

Journal Title
Nuclear Fusion and Plasma Physics
Journal Volume
22
Journal Issue
1
Journal Page Range
p. 61-64
ISSN
0254-6086