Published July 26, 2010
| Version v1
Journal article
Self-erasing and rewritable wettability patterns on ZnO thin films
Creators
- 1. Department of Applied Physics, Aalto University, P.O. Box 15100, FI-00076 Aalto, Espoo (Finland)
- 2. Department of Chemistry, Aalto University, P.O. Box 16100, FI-00076 Aalto, Espoo (Finland)
Description
Self-erasing patterns allow a substrate to be patterned multiple times or could store temporary information for secret communications, and are mostly based on photochromic molecules to change the color of the pattern. Herein we demonstrate self-erasing patterns of wettability on thin ZnO films made by atomic layer deposition. Hydrophilic patterns are written using UV light and decay spontaneously, i.e. become hydrophobic, or are erased aided by vacuum conditions or heat. We demonstrate that these patterns can be applied for channels to confine flow of water without physical walls.
Additional details
Identifiers
- DOI
- 10.1063/1.3460915;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 97
- Journal Issue
- 4
- Journal Page Range
- p. 044102-044102.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41099303
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- COLOR; DEPOSITION; HEAT; LAYERS; SEMICONDUCTOR MATERIALS; SUBSTRATES; SURFACE TREATMENTS; THIN FILMS; ULTRAVIOLET RADIATION; WATER; WETTABILITY; ZINC OXIDES
- Descriptors DEC
- CHALCOGENIDES; ELECTROMAGNETIC RADIATION; ENERGY; FILMS; HYDROGEN COMPOUNDS; MATERIALS; OPTICAL PROPERTIES; ORGANOLEPTIC PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; ZINC COMPOUNDS
Optional Information
- Notes
- (c) 2010 American Institute of Physics