EUV emission from xenon in the 10-80 nm wavelength range using a compact ECR ion source

In this work we have studied the generation of EUV light by a novel compact electron cyclotron resonance ion source (CECRIS). The EUV emission diagnostics of the ECR plasma was accomplished by means of a 1.5 m grazing incidence monochromator which was operated in a wavelength range of 4-90 nm under the condition of medium to high resolution to discriminate between spectra arising from different Xe q+ (q = 2-10) charge states. One of the major accomplishments of this study is assignment of numerous new optical transitions for xenon in the 10-80 nm range to create a database for further investigations. High resolution spectra were recorded in the 10-16 nm range confirming significant contributions from highly excited Xe10+ and Xe9+ ionic states. Major outcome of this work is that the Xe10+ ion emission with λ = 13.4 nm may occurs with such a simplified and compact ECR source. The EUV emission of this particular line is of great interest for lithography applications