Published June 1, 2001 | Version v1
Journal article

Oxygen-enhanced IrMn spin valves deposited by ion-beam and magnetron sputtering

Description

Enhancement of giant magnetoresistance properties of single (bottom) and dual IrMn-based spin valves through exposure of part of the CoFe pinned layer to O2 is reported. Under optimal conditions, a ΔR/R of 10.4% [Hua=460Oe, Hf=5.1Oe, and Hc=4.7Oe for a free and pinned layer thickness (permalloy equivalent) of 50 Aa each] for an ion beam sputtered single spin valve, and a ΔR/R of as high as 20.5% for a magnetron sputtered dual spin valve having a 30 Aa thick CoFe free layer are observed, compared to a value of 6.5% and 10.6% for the corresponding spin valve without O2 exposure, respectively. Transmission electron microscopy results reveal the presence of a thin (10 Aa) crystalline oxygen-containing layer near the IrMn - CoFe pinned layer interface as a result of O2 exposure. X-ray reflectivity data show smoother interfaces for the spin valves subjected to O2 exposure, consistent with the lower Hf and smaller sheet resistance observed for these samples. The enhanced ΔR/R thus can be attributed to improved growth after O2 exposure. [copyright] 2001 American Institute of Physics

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
89
Journal Issue
11
Series
The American Physical Society
Journal Page Range
p. 6925-6927
ISSN
0021-8979

Optional Information

Notes
Othernumber: JAPIAU000089000011006925000001; 242111MMM
Funding organization
(United States)