Published October 1991 | Version v1
Journal article

A small collector-up AlGaAs/GaAs heterojunction bipolar transistor fabricated using H+ implantation

  • 1. Matsushita Electric Industrial Co. Ltd., Moriguchi, Osaka (Japan). Semiconductor Research Center

Description

A small collector-up AlGaAs/GaAs heterojunction bipolar transistor with a collector size of 1 x 10 μ2 is developed by making the entire emitter layer under the external base highly resistive by oblique H+ implantation from both sides along the elongated direction of the collector mesa, and by forming the collector electrode and base electrodes by selfalignment method. The transistor shows high-frequency properties of fT = 31 GHz and fmax = 50 GHz. The relationship between the process used and the properties of the transistor is analyzed. (author)

Additional details

Publishing Information

Journal Title
Japanese Journal of Applied Physics. Part 2, Letters
Journal Volume
30
Journal Issue
10,A
Series
Jpn. J. Appl. Phys., Part 2 Lett.
Journal Page Range
L1787-L1789
CODEN
JAPLD