Published October 1991
| Version v1
Journal article
A small collector-up AlGaAs/GaAs heterojunction bipolar transistor fabricated using H+ implantation
- 1. Matsushita Electric Industrial Co. Ltd., Moriguchi, Osaka (Japan). Semiconductor Research Center
Description
A small collector-up AlGaAs/GaAs heterojunction bipolar transistor with a collector size of 1 x 10 μ2 is developed by making the entire emitter layer under the external base highly resistive by oblique H+ implantation from both sides along the elongated direction of the collector mesa, and by forming the collector electrode and base electrodes by selfalignment method. The transistor shows high-frequency properties of fT = 31 GHz and fmax = 50 GHz. The relationship between the process used and the properties of the transistor is analyzed. (author)
Additional details
Publishing Information
- Journal Title
- Japanese Journal of Applied Physics. Part 2, Letters
- Journal Volume
- 30
- Journal Issue
- 10,A
- Series
- Jpn. J. Appl. Phys., Part 2 Lett.
- Journal Page Range
- L1787-L1789
- CODEN
- JAPLD
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 23038244
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM ARSENIDES; ELECTRICAL PROPERTIES; EPITAXY; FABRICATION; GALLIUM ARSENIDES; ION IMPLANTATION; MOLECULAR BEAMS; PROTONS; TRANSISTORS
- Descriptors DEC
- ALUMINIUM COMPOUNDS; ARSENIC COMPOUNDS; ARSENIDES; BARYONS; BEAMS; CATIONS; CHARGED PARTICLES; CRYSTAL GROWTH METHODS; ELEMENTARY PARTICLES; FERMIONS; GALLIUM COMPOUNDS; HADRONS; HYDROGEN IONS; HYDROGEN IONS 1 PLUS; IONS; NUCLEONS; PHYSICAL PROPERTIES; PNICTIDES; SEMICONDUCTOR DEVICES