Published July 1976
| Version v1
Journal article
Ion beam milling of silica for IR transmission
Creators
- 1. Jenaer Glaswerk Schott und Gen., Mainz (F.R. Germany)
Description
Ion beam etching is applied to produce specimens less than 1 μm thick with a free aperture of 4 mm in diameter. Plane specimens which have the same chemical composition and structure as the bulk material can be obtained. Infrared transmission spectra were obtained from fused silica samples Herasil and Suprasil W. The shapes of these transmission spectra are discussed. The absorption bands in the region 5 to 7 μm have the same intensity for both glasses independent of the OH content of the silica. They are supposed to be overtones of the basic Si-O vibrations at 9.4 μm and 12.4 μm. (author)
Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics E: Scientific Instruments
- Journal Volume
- 9
- Journal Issue
- 7
- Series
- J. Phys., E (London).
- Journal Page Range
- 557-559
- ISSN
- 0022-3735
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 7269510
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Descriptors DEI
- ABSORPTION SPECTRA; ETCHING; INFRARED RADIATION; ION BEAMS; MILLING; SAMPLE PREPARATION; SILICON OXIDES; TRANSMISSION
- Descriptors DEC
- BEAMS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; MACHINING; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SILICON COMPOUNDS; SPECTRA; SURFACE FINISHING
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent