Published July 1976 | Version v1
Journal article

Ion beam milling of silica for IR transmission

  • 1. Jenaer Glaswerk Schott und Gen., Mainz (F.R. Germany)

Description

Ion beam etching is applied to produce specimens less than 1 μm thick with a free aperture of 4 mm in diameter. Plane specimens which have the same chemical composition and structure as the bulk material can be obtained. Infrared transmission spectra were obtained from fused silica samples Herasil and Suprasil W. The shapes of these transmission spectra are discussed. The absorption bands in the region 5 to 7 μm have the same intensity for both glasses independent of the OH content of the silica. They are supposed to be overtones of the basic Si-O vibrations at 9.4 μm and 12.4 μm. (author)

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Physics E: Scientific Instruments
Journal Volume
9
Journal Issue
7
Series
J. Phys., E (London).
Journal Page Range
557-559
ISSN
0022-3735

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
7269510
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
ABSORPTION SPECTRA; ETCHING; INFRARED RADIATION; ION BEAMS; MILLING; SAMPLE PREPARATION; SILICON OXIDES; TRANSMISSION
Descriptors DEC
BEAMS; CHALCOGENIDES; ELECTROMAGNETIC RADIATION; MACHINING; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; SILICON COMPOUNDS; SPECTRA; SURFACE FINISHING

Optional Information

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