Published February 1, 2001
| Version v1
Report
Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution
Creators
- Soufli, Regina
- Spiller, Eberhard A.
- Schmidt, M.A.
- Davidson, J.C.
- Grabner, R.F.
- Gullikson, Eric M.
- Kaufmann, Benjamin B.
- Mrowka, Stanley
- Baker, S.L.
- Chapman, H.N.
- Hudyma, R.M.
- Taylor, J.S.
- Walton, Chris C.
- Montcalm, Claude
- Folta, J.A.
- Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States)
Description
no abstract available
Availability note (English)
Available from www.als.lbl.govAdditional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--13670
Conference
- Title
- 26. SPIE Annual International Symposium on Microlithography
- Dates
- 27 Feb - 2 Mar 2001
- Place
- Santa Clara, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33064568
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- EXTREME ULTRAVIOLET RADIATION; LAYERS; MASKING; OPTICS; RESOLUTION
- Descriptors DEC
- ELECTROMAGNETIC RADIATION; RADIATIONS; ULTRAVIOLET RADIATION
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)