Published September 1, 2011 | Version v1
Journal article

Development of in situ, at-wavelength metrology for soft X-ray nano-focusing

  • 1. Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)
  • 2. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)

Description

At the Advanced Light Source (ALS), we are developing broadly applicable, high-accuracy, in situ, at-wavelength wavefront slope measurement techniques for Kirkpatrick-Baez (KB) mirror nano-focusing. We describe here details of the metrology beamline endstation, the at-wavelength tests, and an original alignment method that have already allowed us to precisely set a bendable KB mirror to achieve a FWHM focused spot size of ∼120 nm, at 1 nm soft X-ray wavelength.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.nima.2010.10.134

Additional details

Identifiers

DOI
10.1016/j.nima.2010.10.134;
PII
S0168-9002(10)02419-8;

Publishing Information

Journal Title
Nuclear Instruments and Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment
Journal Volume
649
Journal Issue
1
Journal Page Range
p. 160-162
ISSN
0168-9002
CODEN
NIMAER

Conference

Title
16. Pan-American national synchrotron radiation instrumentation conference
Acronym
SRI2010
Dates
21-24 Sep 2010
Place
Argonne, IL (United States)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44001611
Subject category
S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ACCURACY; ADVANCED LIGHT SOURCE; ALIGNMENT; FOCUSING; MIRRORS; SOFT X RADIATION; SYNCHROTRON RADIATION; WAVELENGTHS
Descriptors DEC
BREMSSTRAHLUNG; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; RADIATION SOURCES; RADIATIONS; STORAGE RINGS; SYNCHROTRON RADIATION SOURCES; X RADIATION

Optional Information

Copyright
Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.