Effect of cryogenic temperature characteristics on 0.18-μm silicon-on-insulator devices
Creators
- 1. Key Laboratory of Silicon Device and Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
Description
The experimental results of the cryogenic temperature characteristics on 0.18-μm silicon-on-insulator (SOI) metal-oxide-silicon (MOS) field-effect-transistors (FETs) were presented in detail. The current and capacitance characteristics for different operating conditions ranging from 300 K to 10 K were discussed. SOI MOSFETs at cryogenic temperature exhibit improved performance, as expected. Nevertheless, operation at cryogenic temperature also demonstrates abnormal behaviors, such as the impurity freeze-out and series resistance effects. In this paper, the critical parameters of the devices were extracted with a specific method from 300 K to 10 K. Accordingly, some temperature-dependent-parameter models were created to improve fitting precision at cryogenic temperature. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1674-1056/25/7/078501Additional details
Identifiers
Publishing Information
- Journal Title
- Chinese Physics. B
- Journal Volume
- 25
- Journal Issue
- 7
- Journal Page Range
- [7 p.]
- ISSN
- 1674-1056
INIS
- Country of Publication
- China
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 49016950
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ACCURACY; CAPACITANCE; CRYOGENICS; CURRENTS; IMPURITIES; METALS; MOSFET; SILICON; TEMPERATURE DEPENDENCE
- Descriptors DEC
- ELECTRICAL PROPERTIES; ELEMENTS; FIELD EFFECT TRANSISTORS; MOS TRANSISTORS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; SEMIMETALS; TRANSISTORS