Published July 2016 | Version v1
Journal article

Effect of cryogenic temperature characteristics on 0.18-μm silicon-on-insulator devices

  • 1. Key Laboratory of Silicon Device and Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)

Description

The experimental results of the cryogenic temperature characteristics on 0.18-μm silicon-on-insulator (SOI) metal-oxide-silicon (MOS) field-effect-transistors (FETs) were presented in detail. The current and capacitance characteristics for different operating conditions ranging from 300 K to 10 K were discussed. SOI MOSFETs at cryogenic temperature exhibit improved performance, as expected. Nevertheless, operation at cryogenic temperature also demonstrates abnormal behaviors, such as the impurity freeze-out and series resistance effects. In this paper, the critical parameters of the devices were extracted with a specific method from 300 K to 10 K. Accordingly, some temperature-dependent-parameter models were created to improve fitting precision at cryogenic temperature. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/25/7/078501

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
25
Journal Issue
7
Journal Page Range
[7 p.]
ISSN
1674-1056

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
49016950
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Descriptors DEI
ACCURACY; CAPACITANCE; CRYOGENICS; CURRENTS; IMPURITIES; METALS; MOSFET; SILICON; TEMPERATURE DEPENDENCE
Descriptors DEC
ELECTRICAL PROPERTIES; ELEMENTS; FIELD EFFECT TRANSISTORS; MOS TRANSISTORS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES; SEMIMETALS; TRANSISTORS