Published April 10, 2024 | Version v1
Journal article

Chemical trend of radiative recombination in III-nitrides

  • 1. Beijing Computational Science Research Center, Beijing 100193, China
  • 2. School of Electrical Engineering, Wuhan University, Wuhan, Hubei 430072, China
  • 3. School of Materials Science and Engineering, Northwestern Polytechnical University, Xi'an 710072, China

Description

Since charge-carrier radiative recombination is a key process in semiconductors that enables light emission, it is critical to understand its chemical trend and microscopic mechanisms. Using III-nitride semiconductors as prototypical examples, we rigorously study the radiative recombination mechanisms employing first principles. We show that the radiative recombination coefficient is competitively impacted by the band gap, effective masses, and dipole matrix elements, but the band gap plays a dominant role. The radiative recombination coefficient is actually stronger in AlN, as compared to the ones in InN and GaN, despite the fact that AlN-based light-emitting diodes (LEDs) currently exhibit low efficiencies. However, the polarization direction of light emission in AlN is qualitatively different from those in InN and GaN due to valence-band reordering, which may lead to additional complication in light extraction. Our insights pave the way to optimize the optoelectronic performance of wide-band-gap LEDs.

Additional details

Identifiers

DOI
10.1103/PhysRevMaterials.8.044602;
Crossref Funder ID
10.13039/501100001809;

Publishing Information

Journal Title
Physical Review Materials
Journal Volume
8
Journal Issue
4
Journal Page Range
8 pgs.
ISSN
2475-9953

Optional Information

Copyright
©2024 American Physical Society
Contract/Grant/Project number
52172136; 11991060; 12088101; U2230402
Notes
Contact Email: suhuaiwei@csrc.ac.cn; Contact Email: xie.zhang@nwpu.edu.cn; Record automatically processed
Funding organization
National Natural Science Foundation of China