Published January 2014 | Version v1
Journal article

Time-dependent degradation of threshold voltage in AlGaN/GaN high electron mobility transistors

  • 1. School of Advanced Materials and Nanotechnology, Xidian University, Xi'an 710071 (China)
  • 2. Key Laboratory of Microelectronics Device and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029 (China)
  • 3. Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071 (China)

Description

This paper gives a detailed analysis of the time-dependent degradation of the threshold voltage in AlGaN/GaN high electron mobility transistors (HEMTs) submitted to off-state stress. The threshold voltage shows a positive shift in the early stress, then turns to a negative shift. The negative shift of the threshold voltage seems to have a long recovery time. A model related with the balance of electron trapping and detrapping induced by shallow donors and deep acceptors is proposed to explain this degradation mode. (condensed matter: electronic structure, electrical, magnetic, and optical properties)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-1056/23/1/017303

Additional details

Publishing Information

Journal Title
Chinese Physics. B
Journal Volume
23
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1674-1056