Published August 5, 1975 | Version v1
Patent Open

Multiple-source plasma-overlap laser

Description

There are disclosed lasers employing lithium--indium ion mixtures or beryllium--gallium ion mixtures, in which the active medium is produced by overlap of two plasmas derived from optical or electron beam vaporization of material from two separated metallic sources extending parallel to the intended laser axis. Typically, a pulsed vaporization process produces ionized plasmas that can produce a Penning collision energy transfer in the plasma overlap region to produce the laser population inversion. Superradiant lasing action is the simplest mode of stimulated emission of the coherent radiation. A charge transfer system employing two species of atoms, either one or both being in an ionized state, also can produce the population inversion. (auth)

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Additional titles

Augmented title (English)
Patent

Publishing Information

Imprint Pagination
6 p.
IPC:
Int. Cl.H01s3/22; H01s3/09.
IPC
Int. Cl.H01s3/22; H01s3/09.
Patent number
US patent document 3,898,587

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
7228749
Subject category
S42: ENGINEERING;
Descriptors DEI
BERYLLIUM IONS; GALLIUM IONS; LASERS; POPULATION INVERSION; SPECIFICATIONS
Descriptors DEC
AMPLIFIERS; ATOMIC IONS; CHARGED PARTICLES; IONS