Liquid waste processing device
Description
Purpose: To apply volume-reduction to liquid wastes resulted after electrolytic decontamination of miscellaneous solid wastes or equipments being used in a nuclear power plant by an electrolytic polishing device. Constitution: Electrolytic liquid wastes (aqueous H2SO4 solution) resulted from an electrolytic polishing device is concentrated under heating in an electrolytic liquid waste processing vessel, and highly concentrated H2SO4 is subjected to a decomposing reaction with copper. The copper leached out is recovered electrolytically and electrolytic liquid wastes is de-volumed. Accordingly, electrolytic liquid wastes reduced with the decomtaminating performance due to the accumulation of radioactivity and the degradation in the electrolytic liquid after being used for a long period of time for the decontamination of miscellaneous solid wastes such as of pipeways and equipments and decontamination of equipments are decomposed into SO2 gas by the reaction with copper. In this way, contaminated electrolytic liquid wastes can be de-volume thereby enabling to decrease the amount of secondary wastes generated as compared with a conventional neutralizing method by the addition of aqueous alkali solutions. (Kamimura, M.)
Availability note (English)
Available from JAPIO. Also available from INPADOC.Additional details
Publishing Information
- Imprint Pagination
- 5 p.
- IPC:
- Int. Cl. G21F9/06.
- IPC
- Int. Cl. G21F9/06.
- Patent number
- JP patent document 60-211395/A/
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 17074103
- Subject category
- S12: MANAGEMENT OF RADIOACTIVE WASTES, AND NON-RADIOACTIVE WASTES FROM NUCLEAR FACILITIES;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- COPPER; DECOMPOSITION; DECONTAMINATION; ELECTROPOLISHING; EVAPORATION; LIQUID WASTES; SOLID WASTES; SULFONIC ACIDS; SULFUR OXIDES
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL REACTIONS; CLEANING; ELECTROLYSIS; ELEMENTS; METALS; ORGANIC ACIDS; ORGANIC COMPOUNDS; ORGANIC SULFUR COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PHASE TRANSFORMATIONS; POLISHING; SULFUR COMPOUNDS; SURFACE FINISHING; TRANSITION ELEMENTS; WASTES
Optional Information
- Secondary number(s)
- JP patent application 59-68162.