Effects of high magnetic field on the structure evolution, magnetic and electrical properties of the molecular beam vapor deposited FexNi1−x (0.3≤x<0.8) thin films

Nanocrystalline FexNi1−x (in at%, x=0.74, 0.6, 0.55, and 0.3) thin films were prepared on a 25 °C quartz substrate by using a molecular beam vapor deposition method with and without a 6 T magnetic field. The microstructure of the thin films was characterized by energy dispersive x-ray spectroscopy, x-ray diffractometry and transmission electron microscopy. The magnetic and electrical properties of the thin films were examined by a vibrating sample magnetometer and four-point probe method. Results show that the thicknesses of these films with different compositions are 50, 90, 80, and 150 nm, correspondingly. The crystallinity of FexNi1−x (x=0.74 and 0.6) thin films is enhanced, and the γ 〈111〉 orientation degree of the FexNi1−x (x=0.55 and 0.3) thin films increases under a 6 T magnetic field. The grain refinement and defect decrease under 6 T magnetic field are affirmed by TEM. A 6 T magnetic field can help the thin films transform from anisotropy to isotropy. The soft magnetic properties of the FexNi1−x (x=0.74, 0.6, 0.55, and 0.3) thin films are enhanced, and their resistivities decrease under a 6 T magnetic field. - Highlights: ► Crystallinity of thin films increases under a 6 T magnetic field. ► Defects of thin films reduce under 6 T magnetic field. ► Grains are refined and size distribution is narrow under 6 T magnetic field. ► 6 T magnetic field helps thin films transform from anisotropy to isotropy. ► Soft magnetic properties of films are improved under 6 T magnetic field