Published 1990 | Version v1
Book

Molecular dynamics simulations of the structural, vibrational, and electronic properties of amorphous silicon

  • 1. Iowa State Univ. of Science and Technology, Ames, IA (USA). Dept. of Physics

Description

Amorphous silicon models have been computer-generated by melt-quenching and film deposition molecular dynamics simulations, employing classical interatomic Si-potentials. The structural, vibrational and electronic properties of these models is described. Dangling-bond gap states are well localized whereas, floating bonds gap states are considerably less localized with wavefunction amplitudes on the neighbors of the five-coordinated atom. In contrast to melt-quenched models, the a-Si films displayed voids, a 15-28% lower density than c-Si, and no five- coordinated atoms. A-Si:H models with 5 and 22% hydrogen, and both monohydride and dihydride species, have also been developed

Additional details

Publishing Information

Publisher
Materials Research Society.
Imprint Place
Pittsburgh, PA (USA)
ISBN
1-55899-081-X
Imprint Title
Amorphous silicon technology-1990
Imprint Pagination
796 p.
Journal Page Range
p. 251-259.

Conference

Title
Spring meeting of the Materials Research Society (MRS).
Dates
16-21 Apr 1990.
Place
San Francisco, CA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
22054833
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
COMPUTERIZED SIMULATION; ELECTRONIC STRUCTURE; MOLECULAR STRUCTURE; POTENTIALS; SILICON; VIBRATIONAL STATES
Descriptors DEC
ELEMENTS; ENERGY LEVELS; EXCITED STATES; SEMIMETALS; SIMULATION

Optional Information

Secondary number(s)
CONF-900466--.