Published 1990
| Version v1
Book
Molecular dynamics simulations of the structural, vibrational, and electronic properties of amorphous silicon
Creators
- 1. Iowa State Univ. of Science and Technology, Ames, IA (USA). Dept. of Physics
Description
Amorphous silicon models have been computer-generated by melt-quenching and film deposition molecular dynamics simulations, employing classical interatomic Si-potentials. The structural, vibrational and electronic properties of these models is described. Dangling-bond gap states are well localized whereas, floating bonds gap states are considerably less localized with wavefunction amplitudes on the neighbors of the five-coordinated atom. In contrast to melt-quenched models, the a-Si films displayed voids, a 15-28% lower density than c-Si, and no five- coordinated atoms. A-Si:H models with 5 and 22% hydrogen, and both monohydride and dihydride species, have also been developed
Additional details
Publishing Information
- Publisher
- Materials Research Society.
- Imprint Place
- Pittsburgh, PA (USA)
- ISBN
- 1-55899-081-X
- Imprint Title
- Amorphous silicon technology-1990
- Imprint Pagination
- 796 p.
- Journal Page Range
- p. 251-259.
Conference
- Title
- Spring meeting of the Materials Research Society (MRS).
- Dates
- 16-21 Apr 1990.
- Place
- San Francisco, CA (USA).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 22054833
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- COMPUTERIZED SIMULATION; ELECTRONIC STRUCTURE; MOLECULAR STRUCTURE; POTENTIALS; SILICON; VIBRATIONAL STATES
- Descriptors DEC
- ELEMENTS; ENERGY LEVELS; EXCITED STATES; SEMIMETALS; SIMULATION
Optional Information
- Secondary number(s)
- CONF-900466--.