Published June 1995
| Version v1
Journal article
Industrial applications of low-temperature plasma physics
Creators
- 1. University of California, Los Angeles, California 90024-1594 (United States)
Description
The application of plasma physics to the manufacturing and processing of materials may be the new frontier of our discipline. Already partially ionized discharges are used in industry, and the performance of plasmas has a large commercial and technological impact. However, the science of low-temperature plasmas is not as well developed as that of high-temperature, collisionless plasmas. In this paper several major areas of application are described and examples of forefront problems in each are given. The underlying thesis is that gas discharges have evolved beyond a black art, and that intellectually challenging problems with elegant solutions can be found. copyright 1995 American Institute of Physics
Additional details
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 2
- Journal Issue
- 6
- Journal Page Range
- p. 2164-2175.
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 27024548
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- COLD PLASMA; COLLISIONAL PLASMA; ELECTRIC DISCHARGES; ETCHING; INTEGRATED CIRCUITS; ION IMPLANTATION; ISOTOPE SEPARATION; MANUFACTURING; SEMICONDUCTOR MATERIALS
- Descriptors DEC
- ELECTRONIC CIRCUITS; MATERIALS; PLASMA; SEPARATION PROCESSES