Published June 1995 | Version v1
Journal article

Industrial applications of low-temperature plasma physics

Creators

  • 1. University of California, Los Angeles, California 90024-1594 (United States)

Description

The application of plasma physics to the manufacturing and processing of materials may be the new frontier of our discipline. Already partially ionized discharges are used in industry, and the performance of plasmas has a large commercial and technological impact. However, the science of low-temperature plasmas is not as well developed as that of high-temperature, collisionless plasmas. In this paper several major areas of application are described and examples of forefront problems in each are given. The underlying thesis is that gas discharges have evolved beyond a black art, and that intellectually challenging problems with elegant solutions can be found. copyright 1995 American Institute of Physics

Additional details

Publishing Information

Journal Title
Physics of Plasmas
Journal Volume
2
Journal Issue
6
Journal Page Range
p. 2164-2175.
ISSN
1070-664X
CODEN
PHPAEN

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
27024548
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
COLD PLASMA; COLLISIONAL PLASMA; ELECTRIC DISCHARGES; ETCHING; INTEGRATED CIRCUITS; ION IMPLANTATION; ISOTOPE SEPARATION; MANUFACTURING; SEMICONDUCTOR MATERIALS
Descriptors DEC
ELECTRONIC CIRCUITS; MATERIALS; PLASMA; SEPARATION PROCESSES