Gas supply device

Purpose: When injecting gas during plasma discharge, to prevent erronous operation of the piezoelectric valves due to vibrations and to inject gas into the vacuum vessel by accurately controlling gas flow. Constitution: The piezoelectric valve designed to control the flow of gas when charging vacuum vessels is installed between the vacuum vessel and the gas cylinder and a pulse voltage generator to control the valve (open/close) and the reverse voltage generator to apply a reverse current to the valve element are also provided. When a voltage is applied to the piezoelectric element, the piezoelectric element bends. However, when the polarity is changed, the direction of the bend is also reversed. The seat portion is pressed in proportion to the degree of bending. When gas is injected while plasma is being discharged, the gap created, due to vibrations, between the piezoelectric element and the sealing material is prevented by the application of a reverse current. This allows precise control of the gas injection volume as well as the injection interval. This assures maintenance of precise test conditions when testing thermonuclear devices. (Horiuchi, T.)