Published September 15, 2006 | Version v1
Journal article

Energy level alignment between C60 and Al using ultraviolet photoelectron spectroscopy

  • 1. Institute of Physics and Applied Physics, Yonsei University, Seoul 120-749 (Korea, Republic of)
  • 2. Material Science and Engineering, University of Illinois at Urbana Champaign, Urbana, IL 61801 (United States)

Description

The energy level alignment between C60 and Al has been investigated by using ultraviolet photoelectron spectroscopy. To obtain the interfacial electronic structure between C60 and Al, C60 was deposited on a clean Al substrate in a stepwise manner. The valence-band spectra were measured immediately after each step of C60 deposition without breaking the vacuum. The measured onset of the highest occupied molecular orbital energy level was located at 1.59 eV from the Fermi level of Al. The vacuum level was shifted 0.68 eV toward lower binding energy with additional C60 layers. The observed vacuum level shift means that the interface dipole exists at the interface between C60 and Al. The barrier height of electron injection from Al to C60 is 0.11 eV, which is smaller value than that of hole injection

Additional details

Identifiers

DOI
10.1016/j.apsusc.2005.12.095;
PII
S0169-4332(05)01773-3;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
252
Journal Issue
22
Journal Page Range
p. 8015-8017
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.